International Journal of Material Science (IJMSCI)

Editor-in-Chief: Professor Adel Mohamed
Frequency: Quarterly
ISSN Online: 2226-4523
ISSN Print: 2226-4531
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Formation of Nanospheres and Nanorods of Titanium Dioxide in a Low-pressure Ar/O2 Plasma Controlled by a Sputtering Method

Full Text(PDF, 2204KB)  DOI: 10.14355/ijmsci.2013.0304.05

Author: Yousuke Yamazaki, Satoru Iizuka

Abstract: Formation of nanoparticles and nanorods of titanium dioxide (TiO2) in Ar/O2 plasma was investigated by controlling the discharge parameters, such as partial pressure and applied voltage. The nanostructures were produced by reactions of oxygen with titanium atoms, sputtered from a titanium target by reactive sputtering. The deposits were analysed by the SEM, TEM and EDX. Many nanospheres were observed on thin films composed of nanorods, deposited on a silicon substrate at an applied voltage from 1,500 to 3,000 V and a total pressure of 0.5 Torr with a deposition time of 1.5 h. These properties were nearly independent of the partial pressure ratio of oxygen to argon, The diameter of the nanospheres varied from 15 to 100 nm. The thin film quality was controllable by adjusting the electric discharge conditions.

Keywords: Titanium Dioxides; Nanospheres; Nanorods; Plasma Sputtering Method

Cite this paper:
Yousuke Yamazaki, Satoru Iizuka. Formation of Nanospheres and Nanorods of Titanium Dioxide in a Low-pressure Ar/O2 Plasma Controlled by a Sputtering Method. International Journal of Material Science, 2013, 3(4), 163-169. doi: 10.14355/ijmsci.2013.0304.05.

References:

[1] Chigane, M., Shinagawa, T., “Titanium dioxide thin films prepared by electrolysis from aqueous solution of titanium–lactic acid complex for dye-sensitized solar cells”, Thin Solid Films 520 (2012): 3510-3514.

[2] Choi, H., Stathatos, E., Dionysiou, D., “Photocatalytic TiO2 films and membranes for the development of efficient wastewater treatment and reuse systems”, Desalination 202 (2007): 199-206.

[3] Feng, S., Yang, J., Liu, M., Zhu, H., Zhang, J., Li, G., Peng, J., Liu, Q., “Hydrothermal growth of double-layer TiO2 nanostructure film for quantum dot sensitized solar cells”, Thin Solid Films 520 (2012): 2745-2749.

[4] Dupuis, A-C., Jodin, L., Rouvière, L. E., “Catalytic growth of TiO2 nanowires from a TiN thin film”, Appl. Surface Sci. 253 (2006): 1227-1235.

[5] Fujishima, A., Rao, T. N., Tryk, D. A., “Titanium dioxide photocatalysis”, J. Photochem. Photobiol. C: Photochem. Rev. 1 (2000): 1-21.

[6] Iizuka, S., Muraoka, T., “Single-crystal MgO hollow-nanospheres formed in RF impulse discharge plasmas”, J.Nanomaterials, 2012, Article ID 691874, 6 pages, doi:10.1155/2012/691874.

[7] Kozuka, H., Takahashi, Y., Zhao, G., Yoko, T., “Preparation and photoelectrochemical properties of porous thin films composed of submicron TiO2 particles”, Thin Solid Films 358 (2000): 172-179.

[8] Liu, Z. –H., Su, X. –J. , Hou, G. –L. , Bi, S. , Xiao, Z. , Jia, H. –P., “Enhanced performance for dye-sensitized solar cells based on spherical TiO2 nanorod-aggregate light-scattering layer”, J. Power Sources 218 (2012): 280-285.

[9] Muraoka, T., Kashimura, T., Iizuka, S., “Spherical MgO microparticle deposition by RF impulse discharge with small coaxial electrodes”, Thin Solid Films 518 (2009): 1012-1015.

[10] Nishimura, G., Iizuka, S., Shimizu, T., Sato, N., “Diamond-particles levitated in a reactive plasma”, Diam. Relat. Mater. 12 (2003): 374-377.

[11] Pradhan, S. S., Pradhan, S. K., Bagchi, S., Barhai, P. K., “Root growth of TiO2 nanorods by sputtering”, J. Crystal Growth 330 (2011): 1-4.

[12] Sanz, M., Walczak, M., Oujja, M., Cuesta, A., Castillejo, M., “Nanosecond pulsed laser deposition of TiO2: nanostructure and morphology of deposits and plasma diagnosis”, Thin Solid Films 517 (2009): 6546-6552.